JSM 2004 Online Program

Abstract #300248

This is the preliminary program for the 2004 Joint Statistical Meetings in Toronto, Canada. Currently included in this program is the "technical" program, schedule of invited, topic contributed, regular contributed and poster sessions; Continuing Education courses (August 7-10, 2004); and Committee and Business Meetings. This on-line program will be updated frequently to reflect the most current revisions.

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Activity Number:	316
Type:	Invited
Date/Time:	Wednesday, August 11, 2004 : 10:30 AM to 12:20 PM
Sponsor:	Section on Quality and Productivity
Abstract - #300248
Title:	Profile Monitoring in Semiconductor Manufacturing
Author(s):	Vivek B. Ajmani*+
Companies:	General Mills, Inc.
Address:	330 University Ave., SE, Minneapolis, MN, 55414,
Keywords:	linear profile ; nonlinear models ; regression ; EWMA ; Hotelling
Abstract:	Control charts are widely used in semiconductor manufacturing to monitor processes. These control charts are typically used to monitor univariate parameters of interest to detect departures from their intended target. There are instances where it may be of interest to monitor profiles of the variables across time or space. This talk focuses on applications of both linear and nonlinear profiles monitoring in semiconductor manufacturing. Examples using actual data from Intel Manufacturing will be presented.

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