Abstract #301089

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JSM 2003 Abstract #301089
Activity Number: 367
Type: Contributed
Date/Time: Wednesday, August 6, 2003 : 10:30 AM to 12:20 PM
Sponsor: Section on Physical and Engineering Sciences
Abstract - #301089
Title: A Kurtosis-based Statistical Measure for Two-dimensional Processes and Its Applications to Image Sharpness
Author(s): Nien Fan Zhang*+ and Andras Vladar and Mike Postek and Bob Larrabee
Companies: National Institute of Standards and Technology and National Institutes of Standards and Technology and National Institutes of Standards and Technology and National Institute of Standards and Technology
Address: Statistical Engineering Division, Gaithersburg, MD, 20899-0001,
Keywords: autocorrelation function ; scanning electron microscope ; Fourier transform ; metrology ; periodogram
Abstract:

Fully automated or semiautomated scanning electron microscopes (SEM) are now commonly used in semiconductor production. The testing and proving that the instrument is performing at nano-scale level for production on a day-by-day basis, however, is not readily employed. We propose a statistical measure for the image sharpness based on bivariate kurtosis. This methodology has been successfully applied to the SEMs.


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